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案例詳情 / Case Details
等離子體霧化制備粉末材料生產(chǎn)線
編號(hào): JTDLZWH
技術(shù)方案簡(jiǎn)介: 等離子體做為一種頂層參數(shù)技術(shù),在粉體材料的處理和合成制備方面的應(yīng)用是行業(yè)領(lǐng)頭的高新技術(shù),目前已經(jīng)成為許多國(guó)家的研究熱點(diǎn)。 本設(shè)備系列通過(guò)把固體顆粒注入惰性氣體等離子體中,使之在等離子體高溫作用下完全蒸發(fā),以蒸汽形式存在,然后利用氣淬冷卻技術(shù)進(jìn)行快速冷卻,使飽和蒸汽快速冷凝、成核、生長(zhǎng)而形成超細(xì)粉末。
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等離子體霧化制備粉末材料生產(chǎn)線


設(shè)備用途及原理

  等離子體做為一種頂層工藝技術(shù),在粉體材料的處理和合成制備方面的應(yīng)用是行業(yè)領(lǐng)頭的高新技術(shù),目前已經(jīng)成為許多國(guó)家的研究熱點(diǎn)。

  本設(shè)備系列通過(guò)把固體顆粒或絲材注入惰性氣體等離子體中,使之在等離子體高溫作用下完全蒸發(fā),以蒸汽形式存在,然后利用氣淬冷卻技術(shù)進(jìn)行快速冷卻,使飽和蒸汽快速冷凝、成核、生長(zhǎng)而形成超細(xì)粉末。


Application and Principles

    The plasma, as a technology under ultimate conditions, is an advanced and new technology in the application for disposition and synthesis and preparation of powdered material, and currently prevails among studies in many countries.

    Its working principles refer to several steps. First, inject solid particles into inert gas plasma and completely evaporate them under the high temperature of the plasma, existing as steam. And then cool them fast with gas quenching cooling technology, and finally allow saturated steam to be rapidly condensed, nucleated, grew and formed into superfine powder.


設(shè)備優(yōu)勢(shì)及特點(diǎn)

  國(guó)內(nèi)初創(chuàng)全系列先進(jìn)超細(xì)/納米粉體材料技術(shù)解決方案,自主研發(fā)銷售,在鈦、鈦合金及難熔金屬、3D打印粉末制備,以及軍工航天級(jí)單晶基礎(chǔ)原材料制備領(lǐng)域具有廣闊應(yīng)用市場(chǎng)。

   1、金屬:Cu,Fe,Al,Mo,W,Ni,Re,Ta,Ti 等及其合金;

   2、氧化物:Al2O3, MgOTiO2,ZrO2,SiO2等;

   3、碳化物:WC,TiCB4C,SiC等;

   4、氮化物:AiN,TiN,BN,Si3N4等。


Advantages and Features

    Owning to advanced technological superiorities, this equipment series are commonly applied to the preparation of superfine/nano-powdered material with highly chemical purity:

1. Metals: Cu, Fe, Al, Mo, W, Ni, Re, Ta, Ti and their alloys;

2. Oxides: Al2O3, MgO, TiO2, ZrO2, SiO2 and so on;

3. Carbides: WC, TiC, B4C, SiC and so on;

4. Nitrides: AiN, TiN, BN, Si3N4 and so on.

設(shè)備的創(chuàng)新點(diǎn)

1.組合模塊式多功能輸送原材料裝置,包括:液體態(tài)、氣態(tài)、粉末態(tài)原材料均勻精密送料裝置、絲狀原材料均勻精密送料裝置、塊狀真空熔煉精密限流導(dǎo)流澆注裝置;能滿足不同狀態(tài)的原材料生產(chǎn);

2.等離子體電源和等離子體發(fā)生器也是本項(xiàng)目的關(guān)鍵技術(shù)創(chuàng)新點(diǎn)。為了提高霧化效率和霧化過(guò)程的穩(wěn)定進(jìn)行,本項(xiàng)目首次提出超高溫等離子體發(fā)生器、等離子氣體種類選擇、以及氣體流量金屬流率均合理匹配,可以生產(chǎn)高性能全系列金屬單質(zhì)和金屬合金超細(xì)/納米粉末,包括:化學(xué)活性強(qiáng)的金屬 Mg/Al/Ti/Zr 及合金等;高溫金屬 W/Mo/Ni/Ta 及合金等;

3. 其專業(yè)設(shè)計(jì)的化學(xué)反應(yīng)室能反應(yīng)生成多種高化合度的超純度多元素復(fù)合材料;

4. 提出了粉末粒度、氧含量與流動(dòng)性精密智能控制的關(guān)鍵技術(shù)點(diǎn)

5. **的急冷技術(shù),制備納米級(jí)粉末材料。

設(shè)備技術(shù)先進(jìn)性

1.本設(shè)備具備增材制造用高性能粉末的裝置,質(zhì)效比高,智能控制集成度高;

2.首創(chuàng)粉末粒度在線測(cè)量及反饋精密控制技術(shù),讓行業(yè)技術(shù)從此脫離個(gè)人經(jīng)驗(yàn)的依賴階段,進(jìn)入到智能制造時(shí)代;(選配)

3.粉末的氧含量過(guò)程綜合控制技術(shù);

4. 粉末的流動(dòng)性指標(biāo)關(guān)鍵控制技術(shù);

本項(xiàng)目通過(guò)采用組合模塊式均勻精密的原材料送料裝置、專用霧化塔設(shè)計(jì)技術(shù)、霧化氣體再循環(huán),利用多向冷卻粉末技術(shù),加快霧化粉末冷卻速度,減少霧化塔內(nèi)單位體積粉末顆粒濃度,降低粉末碰撞幾率,大大減低粉末之間的粘結(jié)。

5.提高-45+15μm區(qū)間粉末(應(yīng)用于增材成型SLM等主流技術(shù)路徑收得率的關(guān)鍵控制技術(shù);

本項(xiàng)目采用等離子氣體霧化技術(shù)和合適的霧化工藝(主要是霧化溫度和壓力)制備粉末提高-45+15μm粉末的收得率和球形度,以保證粉末的良好的流動(dòng)性。本項(xiàng)目研究得知,制備鎳基、不銹鋼粉末方面-45μm粉末的收得率大于70%,而且通過(guò)等離子體的結(jié)構(gòu)優(yōu)化和霧化工藝的配合可以減少-15μm粉末的含量,從而有效提高-45+15μ m 粉末的收得率;

6.化學(xué)活性材料表面鈍化技術(shù),保證產(chǎn)品使用過(guò)程安全性;

7.設(shè)備防靜電設(shè)計(jì)技術(shù)。

 技術(shù)參數(shù)

1.技術(shù)參數(shù)

2.生產(chǎn)能力:30~60KG/小時(shí)(依據(jù)材料密度而不同)

3.功率:230KW

4.電源電壓:380V50Hz

5.極限真空度:10Pa

6.保護(hù)氣氛:N2、Ar

7.冷卻水額定壓力:0.3MPa

8.氣源額定壓力:0.6MPa

9.霧化充氣壓力:0.5MPa

技術(shù)指標(biāo)

1.粉末成品率分布:D70=15-45μm(以鈦及鈦合金粉末為例)

2.粉末氧增量:≤100ppm(以純鈦為例。實(shí)際生產(chǎn)過(guò)程中為應(yīng)用安全,該類化學(xué)活性粉末材料必須表面鈍化處理,氧含量應(yīng)至800~1500ppm;)

3.粉末流動(dòng)性:≤25s/50g


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等離子感應(yīng)熔煉定向氣霧化制備粉末材料生產(chǎn)線


設(shè)備用途及原理

   PIGA裝置工作原理,是利用等離子流在水冷銅坩堝中進(jìn)行熔煉,坩堝底部與一個(gè)感應(yīng)加熱導(dǎo)流噴嘴相連(導(dǎo)流噴嘴也是銅質(zhì)材料),金屬熔液經(jīng)導(dǎo)流噴嘴進(jìn)入真空霧化系統(tǒng),利用惰性氣體進(jìn)行霧化制粉。

等離子感應(yīng)熔煉定向氣霧化設(shè)備適用于需要使用無(wú)陶瓷生產(chǎn)工藝的活性材料和難熔材料,如Ti、TiAl、FeGdFeTb、ZrCr.


Application and Principles

         The performance principles of PIGA equipment refer to the smelting in water- cooling copper crucible with plasma jet. The bottom of the crucible connects with an induction heating fluid-direction nozzle (the fluid-directing nozzle is made of copper), through which metal liquid flow out into vacuum atomization system and is generated into powder with inert gas.

Plasma induction smelting directional gas atomization equipment is applied to the active material and hard-smelted material requiring for free-ceramic production technology, such as Ti, TiAl, FeGd, FeTb, Zr, and Cr and so on.


設(shè)備優(yōu)勢(shì)及特點(diǎn)

  本設(shè)備主要有以下特點(diǎn):

1、適合制備活性材料粉末(比如鈦)或難熔合金;

2、無(wú)陶瓷生產(chǎn)工藝,可制備高純度、超細(xì)納米粉末材料。


設(shè)備核心模塊結(jié)構(gòu)技術(shù)

  等離子感應(yīng)熔煉定向氣霧化設(shè)備由以下九大核心模塊及其周邊部件組成:.

1、等離子熔煉爐;

2、霧化系統(tǒng);

3、霧化罐體;

4、粉塵收集系統(tǒng);

5、真空系統(tǒng);

6、冷卻系統(tǒng);

7、氣體系統(tǒng);

8、電氣及控制系統(tǒng);

9、中頻感應(yīng)電源。



等離子體旋轉(zhuǎn)電極離心霧化制備粉末材料生產(chǎn)線

設(shè)備用途及原理

等離子體旋轉(zhuǎn)電極離心霧化技術(shù)原理,是以金屬或合金制成自耗電極,其端面受離子體炬加熱而熔融為液態(tài),通過(guò)電極高速旋轉(zhuǎn)的離心力將液體拋出并粉碎為細(xì)小液滴,繼之冷凝為粉末。保護(hù)氣氛可選用惰性氣體,**是氦氣。因?yàn)楹獾臒釋?dǎo)率最高,約為氬氣的10倍,既能提高冷卻速度,又可改善離子體炬特性。

等離子旋轉(zhuǎn)電極離心霧化制粉設(shè)備能制取高純度球形高溫金屬粉末材料,其制取的粉末材料粒度為50-500微米,是制造高推重比航空發(fā)動(dòng)機(jī)渦輪盤、壓氣機(jī)盤等高溫轉(zhuǎn)動(dòng)部件的原材料。


Application and Principles

The principle of plasma rotation electrode centrifuge atomization technology refers to that the end face of self-consuming electrode made of metal or alloy is melted into liquid state with being heated by plasma torch, then the liquid is thrown out of by centrifugal force caused by electrode high speed rotating and smashed into tiny droplets, and consequently these droplets are congealed to be powder. Inert gas can be an available option to be protecting gas, and among which helium is the best due to its highest thermal conductivity, about 10 times of argon, not only increasing cooling speed but also improving the properties of the plasma torch.

Plasma rotation electrode centrifuge atomization preparation powder equipment can produce spherically hot metal powdered material with high purity and its particle size is 50-500 nanometers. These powdered material can work as the raw material for producing high thrust-weight-ratio turbine disc and compressor disc of aero-engine, and other hot rotating components.


設(shè)備優(yōu)勢(shì)及特點(diǎn)

本設(shè)備具有以下技術(shù)優(yōu)勢(shì)和特點(diǎn):

1、可以制備鎳基高溫合金、鈦合金等難熔金屬和活潑金屬粉末,也可制備鉭、鎢、鈷、鉻等各種合金粉末。

2、金屬熔融和霧化金屬過(guò)程中完全避免和與耐火材料接觸,消除了非金屬夾雜物污染源,可生產(chǎn)高潔凈度的粉末材料.

3、粉末形狀規(guī)則,球形率高,表面光潔,流動(dòng)性好;

4、無(wú)衛(wèi)星球粉末及空心粉末;

5、粉末粒度分布范圍較窄。

6、由于凝快克服了偏析現(xiàn)象,可以制取許多特殊合金粉末。


Advantages and Features

This equipment possesses following advantages and features:

1. It can prepare hard-melted metal and active metal powder such as nickel-based hot metal alloy and titanium alloy, as well as various alloy powder such as Ta, W, Co, Cr and other metal-based alloy.

2. It is required to completely avoid fire-resistance materials during the course of metal melting and atomizing, eliminating pollution sources mixed with non-metal medias and thus it can produce high-cleanliness powdered material.

3. The shapes of these produced powder are regular, among which the spherical powder is produced at high possibility, its surface is bright and clean and has good mobility;

4. No satellite-ball powder and hollow powder are produced by this equipment;

5. The scope of particle size distribution is relatively narrow.

6. It can produce several special alloy powder because of segregation phenomena is conquered by curds.


設(shè)備核心模塊結(jié)構(gòu)技術(shù)

等離子體旋轉(zhuǎn)電極離心霧化設(shè)備由以下七大核心模塊及其周邊部件組成:.

   1、霧化室及集粉系統(tǒng);

   2、等離子槍裝置;

   3、傳動(dòng)裝置組件(高轉(zhuǎn)速動(dòng)密封,電機(jī),軸承,電極給進(jìn)裝置);

   4、真空系統(tǒng);

   5、冷卻系統(tǒng);

   6、氣體系統(tǒng)(氣氛控制,等離子槍循環(huán));

   7、電氣及控制系統(tǒng)。


Core Module Structure Technology

Plasma rotation electrode centrifuge atomization equipment is consisted of seven major core modules and peripheral components as below:

1. Atomization room and powder collection system;

2. Plasma gun appliance;

3. Transmission appliance unit (high rotation speed sealing, electrical machine, bears, and electrode movement device);

4. Vacuum system;

5. Cooling system;

6. Gas system (gas environment control, plasma torch circulation);

7. Electric and control system.


直流等離子體直接霧化制備粉末材料生產(chǎn)線


設(shè)備用途及原理

  一種等離子霧化制備高純度球形超細(xì)/納米粉末材料的技術(shù)原理,包括棒材、絲材,粉末顆粒原材料,或液體、氣體原料通過(guò)專用的送料裝置直接送入對(duì)稱高溫等離子體炬形成的等離子焦點(diǎn)區(qū),溫度可以高達(dá)5000K以上,原材料在高溫下被瞬間液化或汽化或熱反應(yīng)分解/合成,并被等離子體高速?zèng)_擊分散霧化成超細(xì)液滴或氣霧狀,在霧化塔中飛行沉積過(guò)程中,與連續(xù)通入霧化塔中的冷卻氣體進(jìn)行快速熱交換,激冷凝固成各種材質(zhì)的高化學(xué)純度球形超細(xì)或納米級(jí)粉末材料。


Application and Principles

           It is a technological principle applied in plasma atomizing preparation for high-purity spherical superfine / nanometer powdered material, including rod material and wire material. Powdered particle raw material or liquid and gas raw material are directly sent by particular material feeding device into the plasma focused area formed by symmetrical hot plasma torch, and the temperature can reach 5000K above. Under such high temperature, raw material will be immediately liquefied or vaporized or decomposed/synthesized with thermal reaction, and also be high-speed impacted, dispersed, and atomized into superfine liquid droplets or gas smoke by symmetrical plasma.

And then, during the course of flying and sedimentation in atomizing tower, they are allowed to have rapidly heat exchanged with cooling gas continuously fed in atomizing tower, and consequently chilled and solidified into various spherical superfine or nanometer powdered material in high chemical purity.


設(shè)備優(yōu)勢(shì)及特點(diǎn)

  本設(shè)備以生產(chǎn)納米級(jí)先進(jìn)粉末材料為主要特點(diǎn),在航空航天等高科技新材料領(lǐng)域有著不同的優(yōu)勢(shì):

1、可生產(chǎn)各種超細(xì)/納米級(jí)金屬粉末,如鎳、鈷、鈦、鋯,鉭等球形粉末。

2、如果通入一些能夠產(chǎn)生合成反應(yīng)的混合氣體,可以生產(chǎn)某些氧化物、碳化物及氮化物等高化學(xué)純度的陶瓷粉末。

   3、用等離子直接霧化制取的粉末粒度一般為納米(nm)級(jí),含氧量很低,具有很高的活性。因此燒結(jié)性能很好,燒結(jié)產(chǎn)品的各項(xiàng)力學(xué)性能大幅度提高。另外用此方法生產(chǎn)的超細(xì)金屬粉末或氧化物粉末還具有極優(yōu)良的磁電和防腐蝕性能,電磁波吸收特性等,在電子半導(dǎo)體材料、航空航天等高科技新材料領(lǐng)域很有前景。


Superiorities and Features

This equipment is primarily featured with producing nanometer advanced powdered material, and possesses unique superiorities of producing high-technological new material applied in aerospace field:

1. It can produce various superfine/nanometer metallic powder, such as Ni, Co, Ti, Zr, Ta and other spherical powder.

2. If fed in some mixed gases which can generate synthetic reaction, it can produce some oxides, carbides, and nitrides and some other high chemically purified ceramic powder.

3. The particle size of the powder directly atomized by plasma is usually nanometer (nm) grade, and has low oxygen content and high activity. Thus, these powders have good sintering character, and each mechanical property of the sintered products have been greatly improved. In addition, the superfine metallic powder or oxide powder produced in this way also possesses amazing magneto-electric character and anti-corrosion property, as well as electromagnetic wave absorption specialty. This equipment has a bright future of producing high-technological new material applied in aerospace field and electronics and semiconductor materials.


設(shè)備核心模塊結(jié)構(gòu)技術(shù)

  等離子體旋轉(zhuǎn)電極離心霧化設(shè)備由以下五大核心模塊及其周邊部件組成:.

   1.送料系統(tǒng),

   2.對(duì)稱等離子體炬及電源;

   3.真空系統(tǒng);

   4.霧化塔和反應(yīng)室;

   5.粉末收集裝置以及后續(xù)與之相連的氣體粉末分離系統(tǒng)、粉末收集系統(tǒng)、氣體凈化再循環(huán)利用系統(tǒng)。


Core Module Structure Technology

Plasma rotating electrode centrifugal atomization equipment is consisted of five major core modules and peripheral components as below:

1. Material feeding system;

2. Symmetrical plasma torch and power supply;

3. Vacuum system;

4. Atomization tower and reaction room;

5. Powder collection device and it connects with gas-powder separating system, powder gathering system, and gas-purification recycling and utilizing system.

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